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KLA 2365
    Description
    KLA2365 Lamp
    Configuration
    11471781
    OEM Model Description
    The KLA / TENCOR 2365 is a high resolution imaging system that can be used in 200mm and 300mm fabs. Applications include ritical etch, critical CMP, photo, and engineering analysis. It is particularly ideal for EOL metal etch and copper CMP layers. The KLA/TENCOR 2365 prober uses UV and visible light source and 0.12-mm pixel size for improved inspection sensitivity for 65-nm node and below design rules. In 2004, KLA introduced our latest generation ultraviolet (“UV”)-based high-resolution imaging inspection system, the 2365, which incorporates multiple-bandwidth brightfield illumination and other enhancements to extend the performance of the 2xxx series to the 90-nm node and below.
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    KLA

    2365

    verified-listing-icon

    Verified

    CATEGORY
    Defect Inspection

    Last Verified: Over 30 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    101317

    Wafer Sizes:

    8"/200mm, 12"/300mm

    Vintage:

    Unknown

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    KLA

    2365

    verified-listing-icon
    Verified
    CATEGORY
    Defect Inspection
    Last Verified: Over 30 days ago
    listing-photo-3418db174cb24a14ab125ec0c94273e9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    101317

    Wafer Sizes:

    8"/200mm, 12"/300mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    KLA2365 Lamp
    Configuration
    11471781
    OEM Model Description
    The KLA / TENCOR 2365 is a high resolution imaging system that can be used in 200mm and 300mm fabs. Applications include ritical etch, critical CMP, photo, and engineering analysis. It is particularly ideal for EOL metal etch and copper CMP layers. The KLA/TENCOR 2365 prober uses UV and visible light source and 0.12-mm pixel size for improved inspection sensitivity for 65-nm node and below design rules. In 2004, KLA introduced our latest generation ultraviolet (“UV”)-based high-resolution imaging inspection system, the 2365, which incorporates multiple-bandwidth brightfield illumination and other enhancements to extend the performance of the 2xxx series to the 90-nm node and below.
    Documents

    No documents

    Similar Listings
    View All

    No Similar Listings