Description
Bright field detection No missing parts Current size : 12Configuration
No ConfigurationOEM Model Description
The KLA / TENCOR 2351 is a Bright-Field Wafer Inspection System. The TENCOR 2351 can be used with 200mm wafer sizes. In July of 2001, an upgrade to the 2350 was introduced, the 2351, which offers enhancements in sensitivity, throughput and ease of use. The KLA 2135 is a wafer inspection system that detects all types of yield-relevant defects on all process layers with high capture rates. It has a two- to three-times throughput improvement over the earlier model KLA 2132 and uses advanced sensor and image processing technologies. The 2135 consistently detects the widest range of defects at the speeds required for high-volume wafer production.Documents
No documents
KLA
2351
Verified
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107147
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
2351
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107147
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Bright field detection No missing parts Current size : 12Configuration
No ConfigurationOEM Model Description
The KLA / TENCOR 2351 is a Bright-Field Wafer Inspection System. The TENCOR 2351 can be used with 200mm wafer sizes. In July of 2001, an upgrade to the 2350 was introduced, the 2351, which offers enhancements in sensitivity, throughput and ease of use. The KLA 2135 is a wafer inspection system that detects all types of yield-relevant defects on all process layers with high capture rates. It has a two- to three-times throughput improvement over the earlier model KLA 2132 and uses advanced sensor and image processing technologies. The 2135 consistently detects the widest range of defects at the speeds required for high-volume wafer production.Documents
No documents