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KLA AIT II
    Description
    Wafer Test
    Configuration
    No Configuration
    OEM Model Description
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
    Documents

    No documents

    PREFERRED
     
    SELLER
    verified-listing-icon

    Verified

    CATEGORY
    Defect Inspection

    Last Verified: 16 days ago

    Buyer pays 12% premium of final sale price
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    125560


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    PREFERRED
     
    SELLER

    KLA

    AIT II

    verified-listing-icon
    Verified
    CATEGORY
    Defect Inspection
    Last Verified: 16 days ago
    listing-photo-c4f3627973564510a7cffcf024640771-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Buyer pays 12% premium of final sale price
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    125560


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Wafer Test
    Configuration
    No Configuration
    OEM Model Description
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
    Documents

    No documents