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Description
Dark Field. Software version 5.3.17, single open cassette handler. SECS II/GEM communication interface, include RTC option, 75MW 488nm Argon Laser, Multi Channel collection optics system with independent programmable spatial filters 10um single incident spot optics, additional 7um and 5 um spot size, flat panel display (AIT 2), Fold down keyboard tray with built-in mouse.Configuration
No ConfigurationOEM Model Description
The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.Documents
No documents
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
24647
Wafer Sizes:
8"/200mm
Vintage:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA
AIT II
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
24647
Wafer Sizes:
8"/200mm
Vintage:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Dark Field. Software version 5.3.17, single open cassette handler. SECS II/GEM communication interface, include RTC option, 75MW 488nm Argon Laser, Multi Channel collection optics system with independent programmable spatial filters 10um single incident spot optics, additional 7um and 5 um spot size, flat panel display (AIT 2), Fold down keyboard tray with built-in mouse.Configuration
No ConfigurationOEM Model Description
The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.Documents
No documents