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KLA AIT II
    Description
    Taken Offline in July
    Configuration
    6"
    OEM Model Description
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
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    KLA

    AIT II

    verified-listing-icon

    Verified

    CATEGORY

    Defect Inspection
    Last Verified: 11 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Deinstalled


    Product ID:

    100099


    Wafer Sizes:

    6"/150mm


    Vintage:

    2000

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    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Deinstalled


    Product ID:

    100099


    Wafer Sizes:

    6"/150mm


    Vintage:

    2000


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Taken Offline in July
    Configuration
    6"
    OEM Model Description
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
    Documents

    No documents

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