Description
Dark field detection No missing parts Current Wafer size : 12Configuration
No ConfigurationOEM Model Description
AMAT / APPLIED MATERIALS ComPlus MP is a wafer inspection system which can be used with 8" wafer sizes. The ComPlus-EV can be further enhanced with the MP (Multi-Perspective) option, which extends the system's exceptional capabilities to perform additional brightfield applications, including the detection of defects in the transistor area such as STI, gate, and tungsten plug layers. The MP option expands the number of detectors and magnifications, enabling higher sensitivity to flat defects at an increased capture rate, providing significantly higher throughput and reduced cost of ownership.Documents
No documents
APPLIED MATERIALS (AMAT)
COMPLUS MP
Verified
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107073
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
COMPLUS MP
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107073
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Dark field detection No missing parts Current Wafer size : 12Configuration
No ConfigurationOEM Model Description
AMAT / APPLIED MATERIALS ComPlus MP is a wafer inspection system which can be used with 8" wafer sizes. The ComPlus-EV can be further enhanced with the MP (Multi-Perspective) option, which extends the system's exceptional capabilities to perform additional brightfield applications, including the detection of defects in the transistor area such as STI, gate, and tungsten plug layers. The MP option expands the number of detectors and magnifications, enabling higher sensitivity to flat defects at an increased capture rate, providing significantly higher throughput and reduced cost of ownership.Documents
No documents