Description
Configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Condition: Complete / Working Status: Installed in cleanroomConfiguration
FIRST NANO EasyTube 3000 Graphene Furnace Configured: 3" wafers and small pieces Materials: Ar, H2, SiH4, CH4 Quartz chamber with graphite susceptor 10kW RF induction heating 2200C max Fully programmable Turbo pump for low pre-processing base pressure (9.0e-7 Torr)OEM Model Description
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FIRST NANO
EasyTube 3000
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
110952
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
FIRST NANO
EasyTube 3000
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
110952
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Condition: Complete / Working Status: Installed in cleanroomConfiguration
FIRST NANO EasyTube 3000 Graphene Furnace Configured: 3" wafers and small pieces Materials: Ar, H2, SiH4, CH4 Quartz chamber with graphite susceptor 10kW RF induction heating 2200C max Fully programmable Turbo pump for low pre-processing base pressure (9.0e-7 Torr)OEM Model Description
None ProvidedDocuments
No documents