Description
Atmospheric Depo LD: 3ea, no modification, CVDConfiguration
Atmospheric Depo LD: 3ea, no modification (Chamber) Atmospheric CVD (process) SiH4, O2, HF (Gas) DOS (Operating system) -PROGRESS TYPE: DCVD -CHAMBER POSITION: SINGLE BODY -DAIHEN Controller : Model CS-8600 PN XE4070 -MANIPULATOR Controller : MECS UTC800F -MONITOR Rack : SK907354-001 RA -Model Configuration : UTC-R800PX-XV0034OEM Model Description
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.Documents
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AVIZA / WATKINS-JOHNSON
WJ-999R
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
105238
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
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AVIZA / WATKINS-JOHNSON
WJ-999R
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
105238
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Atmospheric Depo LD: 3ea, no modification, CVDConfiguration
Atmospheric Depo LD: 3ea, no modification (Chamber) Atmospheric CVD (process) SiH4, O2, HF (Gas) DOS (Operating system) -PROGRESS TYPE: DCVD -CHAMBER POSITION: SINGLE BODY -DAIHEN Controller : Model CS-8600 PN XE4070 -MANIPULATOR Controller : MECS UTC800F -MONITOR Rack : SK907354-001 RA -Model Configuration : UTC-R800PX-XV0034OEM Model Description
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.Documents
No documents