Description
CE Marked YES System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)Configuration
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements 208 V 100.0 A 50/60 Hz 3 Phase Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber F;Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber FOEM Model Description
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.Documents
No documents
CATEGORY
CVD
Last Verified: 18 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150735
Wafer Sizes:
8"/200mm
Vintage:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA ULTIMA HDP-CVD
CATEGORY
CVD
Last Verified: 18 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150735
Wafer Sizes:
8"/200mm
Vintage:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
CE Marked YES System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)Configuration
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements 208 V 100.0 A 50/60 Hz 3 Phase Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber F;Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber FOEM Model Description
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.Documents
No documents