Description
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 PhaseConfiguration
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEM Model Description
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.Documents
No documents
CATEGORY
CVD
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150735
Wafer Sizes:
8"/200mm
Vintage:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA ULTIMA HDP-CVD
CATEGORY
CVD
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150735
Wafer Sizes:
8"/200mm
Vintage:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 PhaseConfiguration
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEM Model Description
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.Documents
No documents