Description

Hardware Configuration : - 3 Dep. PLIS (Precision Liquid Injection System) Chamber - 1 Sputter Etch Chamber - Parts and Modules : (1) 1-Delatech Scrubber Model 859(non-recirc) (2) 1-Main power box w/4 ENI RF Generators (3) 1-Delta RF generator rack w/3 RFPP generators (4) 1-AMAT '0' Heat exchanger (5) 1-Front monitor (6) 1-Rear monitor (7) 3-50x20 Ebara pumps (Refurbished) (8) 2-40x20 Ebara pumps (Refurbished) (9) 1-Mini controller

Configuration

SiO2 CVD (including dry pumps (5 Ea.), Scrubber, etc.)

OEM Model Description

The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.

Documents

No documents

APPLIED MATERIALS (AMAT)

P5000 CVD

Verified

CVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

51182

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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