Description

Details Attached.

Configuration

TEOS CVD (3 Deposition PLIS, 1 Sputter Etch Chamber) Ebara Dry pumps (Fully Refurbished) : 3 Ea. of 50x20 Ebara pumps + 2 Ea. of 40x20 Ebara pumps Gas Scrubber : Delatech Scrubber Model 859

OEM Model Description

The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.

Documents

AMT P5000.pdf

APPLIED MATERIALS (AMAT)

P5000 CVD

Verified

CVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

41304

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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