Description

Description Dimension Qty MAIN BLOCK / 2 COAT 56 75 90 1 CHEMICAL CABINET 1 54 21 67 1 CHEMICAL CABINET 2 35 32 61 1 TEMPERATURE AND HUMIDITY CONTROL UNIT 1 18 39 44 1 TEMPERATURE AND HUMIDITY CONTROL UNIT 2 18 39 44 1 AC TRANSFORMER BOX 24 20 50 1

Configuration

PROCESS BLOCK : 2 COATER BLOCK TYPE : SINGLE WAFER FLOW : LEFT to RIGHT PSB / Process station block 2-1 : COAT -4 NOZZLE -4 RRC PUMP -EBR -1 Back Rinse nozle 2-2 : COAT -4 NOZZLE -4 RRC PUMP -EBR -1 Back Rinse nozle TEMPERATURE AND HUMIDITY CONTROLLER -T&H, SHINWA 2 unit EXTERNAL CHEMICAL SUPPLY CABINET #1 -SOLVENT BUFFER TANK -PHOTO RESIST BOTTLE EXTERNAL CHEMICAL SUPPLY CABINET #2 -HMDS THRMO CONTROLLER -MR-2015 : 3 unit WATER CIRCULATOR -MCE-52W : 3 unit

OEM Model Description

Discover the CLEAN TRACK Mark 8, the cutting-edge coater developer system for 5 to 8-inch wafers. Building on the legacy of the acclaimed Mark V, this advanced model delivers enhanced productivity, superior scalability, and exceptional environmental control. Perfect for R&D and high-volume manufacturing, the Mark 8 ensures stable, top-tier performance for diverse applications.