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Description
TEL ACT8 Single COT/DEVConfiguration
2C2D, L->R, #2 Main Controller, Open Cassette, Inline type, 4 Open Cassette, RRC Pump, E2 Nozzle, ADH×1、TRS×3、CPL×3、LHP×6、CWH×1、WEE×1OEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
No documents
Verified
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
112924
Wafer Sizes:
Unknown
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
ACT 8
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
112924
Wafer Sizes:
Unknown
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
TEL ACT8 Single COT/DEVConfiguration
2C2D, L->R, #2 Main Controller, Open Cassette, Inline type, 4 Open Cassette, RRC Pump, E2 Nozzle, ADH×1、TRS×3、CPL×3、LHP×6、CWH×1、WEE×1OEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
No documents