Description
210x190x200 1,300.00 KgConfiguration
Power Supply: 3 phase, 380 V, 7 A, 60 Hz Heaters: 7 heaters HDMS: (Not explicitly stated – needs confirmation) Resists: 2 resists The machine has two chambers. Whether it can perform development depends on the chemical process. Since this machine currently uses PR photoresist, it only has coating functionality. If used for PI processes, it can perform both coating and development simultaneously. Coaters / Coolers: 2 coater modules. The machine had 3 cool plates and 8 storage in the machine. Tanks: Uses 4 different tanks; equipped with more than 6 flow meters (top side/back side / pre-wet / EBR / cover flow) Wafer Size: Processes 8-inch wafers onlyOEM Model Description
The SUSS ACS200 Gen3 platform is the successful result of a perfect mix of innovative and production proven components. With the capability of up to 4 wet process modules and a maximum of 19 plates it perfectly suits the needs of high volume manufacturing (HVM). The unmatched configuration flexibility of modules and technologies covers not only the requirements of the Advanced Packaging, MEMS and LED market it also bridges the gap between R&D and HVM.Documents
No documents
CATEGORY
Coaters & Developers
Last Verified: 9 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
136190
Wafer Sizes:
8"/200mm
Vintage:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SUSS MicroTec / KARL SUSS
ACS200 Gen3
CATEGORY
Coaters & Developers
Last Verified: 9 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
136190
Wafer Sizes:
8"/200mm
Vintage:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
210x190x200 1,300.00 KgConfiguration
Power Supply: 3 phase, 380 V, 7 A, 60 Hz Heaters: 7 heaters HDMS: (Not explicitly stated – needs confirmation) Resists: 2 resists The machine has two chambers. Whether it can perform development depends on the chemical process. Since this machine currently uses PR photoresist, it only has coating functionality. If used for PI processes, it can perform both coating and development simultaneously. Coaters / Coolers: 2 coater modules. The machine had 3 cool plates and 8 storage in the machine. Tanks: Uses 4 different tanks; equipped with more than 6 flow meters (top side/back side / pre-wet / EBR / cover flow) Wafer Size: Processes 8-inch wafers onlyOEM Model Description
The SUSS ACS200 Gen3 platform is the successful result of a perfect mix of innovative and production proven components. With the capability of up to 4 wet process modules and a maximum of 19 plates it perfectly suits the needs of high volume manufacturing (HVM). The unmatched configuration flexibility of modules and technologies covers not only the requirements of the Advanced Packaging, MEMS and LED market it also bridges the gap between R&D and HVM.Documents
No documents