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6" Coat bowl Bake Plate Chill Plate Fuji Resist (HiPR 6512), EBR (RER-550) Water, Nitrogen Fuji Developer (OPD4262),WaterOEM Model Description
Advanced Linear Track System is a recipe-driven photoresist coater and developer, featuring powerful Rabbit Microprocessors and an intuitive graphical user interface (GUI), which provides unprecedented capabilities for linear track systems.Documents
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C&D SEMI
P8000
Verified
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
80231
Wafer Sizes:
Unknown
Vintage:
Unknown
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View AllC&D SEMI
P8000
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
80231
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
6" Coat bowl Bake Plate Chill Plate Fuji Resist (HiPR 6512), EBR (RER-550) Water, Nitrogen Fuji Developer (OPD4262),WaterOEM Model Description
Advanced Linear Track System is a recipe-driven photoresist coater and developer, featuring powerful Rabbit Microprocessors and an intuitive graphical user interface (GUI), which provides unprecedented capabilities for linear track systems.Documents
No documents