Advanced Linear Track System is a recipe-driven photoresist coater and developer, featuring powerful Rabbit Microprocessors and an intuitive graphical user interface (GUI), which provides unprecedented capabilities for linear track systems.

C&D SEMI

P8000

Photoresist Coater & Developer Cluster System

P9000

C&D’s P9000-30 Frame Processing System is designed to be an effective way of coating wafers prior to saw or cleaning wafers post saw. With its high performance spindle motor and high accuracy stepper motor driving the dispense arm, the P9000-30 is proven reliable and repeatable. After final rinse, the system can be configured with a nitrogen blow off capability. The P900030 system can coat resists or polymers on thin wafers to assist with standard sawing or laser sawing. It can also be used to remove resist or protect coat polymers after saw.

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P8000

P9000

P9000-30

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