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The CLEAN TRACK™ Mark-V is a 30-year-old coater that has revolutionized the concept of conventional photoresist systems. It has introduced various innovative technologies such as a stacked clean oven module layout and high-speed wafer handling robotics, setting worldwide standards for photoresist systems. The Mark-V is capable of handling 75, 100, and 150mm wafers at a rate of 60 wafers per hour and is an open system. It’s an impressive piece of technology!

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