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EBARA F-REX300X
    Description
    De-installed
    Configuration
    No Configuration
    OEM Model Description
    EBARA's CMP system Model F-REX is Chemical Mechanical Polishing system that enables nanometer level planarity (10~20nm on 300mm wafer) in semiconductor manufacturing process. Ebara's CMP system, Model F-REX200M2 and F-REX300X has achieved both an advanced process performance and high productivity. This is made possible with "1-head per 1-table" unique architecture processing an individual wafer delicately while the "4 table platform" enables high throughput.
    Documents

    No documents

    EBARA

    F-REX300X

    verified-listing-icon

    Verified

    CATEGORY
    CMP

    Last Verified: Over 60 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    99820

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    EBARA F-REX300X

    EBARA

    F-REX300X

    CMP
    Vintage: 2001Condition: Used
    Last VerifiedOver 60 days ago
    EBARA F-REX300X

    EBARA

    F-REX300X

    CMP
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    EBARA

    F-REX300X

    verified-listing-icon
    Verified
    CATEGORY
    CMP
    Last Verified: Over 60 days ago
    listing-photo-42f8236b941441e4962dcbf05e60589a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    99820

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    De-installed
    Configuration
    No Configuration
    OEM Model Description
    EBARA's CMP system Model F-REX is Chemical Mechanical Polishing system that enables nanometer level planarity (10~20nm on 300mm wafer) in semiconductor manufacturing process. Ebara's CMP system, Model F-REX200M2 and F-REX300X has achieved both an advanced process performance and high productivity. This is made possible with "1-head per 1-table" unique architecture processing an individual wafer delicately while the "4 table platform" enables high throughput.
    Documents

    No documents

    Similar Listings
    View All
    EBARA F-REX300X

    EBARA

    F-REX300X

    CMPVintage: 2001Condition: UsedLast Verified:Over 60 days ago
    EBARA F-REX300X

    EBARA

    F-REX300X

    CMPVintage: 0Condition: UsedLast Verified:Over 60 days ago