Description
No descriptionConfiguration
Main Body- Wooden H261×W151×D220cm, 1000kgOEM Model Description
The FusionGemini Plasma Asher ES (Enhanced Strip) is a device designed for advanced IC manufacturing. It eliminates the need for “wet” chemical processing to remove post-strip residues, providing a “dry” solution through the use of specialized gas chemistries. This results in dry strip processes that only require a follow-on DI water rinse. The FusionGemini ES can perform resist strip and residue removal in the same chamber, providing high throughput and rapid parallel processing. It also provides the lowest damage of any residue removal-capable plasma asher in the industry, and uses radiant heating for multi-temperature stripping. The FusionGemini ES uses O2, H2:N2, CF4, and custom gases, and is a 200mm photoresist strip system.Documents
No documents
AXCELIS / FUSION
GEMINI ES
Verified
CATEGORY
Ashers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
94891
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AXCELIS / FUSION
GEMINI ES
CATEGORY
Ashers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
94891
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Main Body- Wooden H261×W151×D220cm, 1000kgOEM Model Description
The FusionGemini Plasma Asher ES (Enhanced Strip) is a device designed for advanced IC manufacturing. It eliminates the need for “wet” chemical processing to remove post-strip residues, providing a “dry” solution through the use of specialized gas chemistries. This results in dry strip processes that only require a follow-on DI water rinse. The FusionGemini ES can perform resist strip and residue removal in the same chamber, providing high throughput and rapid parallel processing. It also provides the lowest damage of any residue removal-capable plasma asher in the industry, and uses radiant heating for multi-temperature stripping. The FusionGemini ES uses O2, H2:N2, CF4, and custom gases, and is a 200mm photoresist strip system.Documents
No documents