Description
No missing partsConfiguration
No ConfigurationOEM Model Description
This Nikon Step-and-Repeat Scanning System is compatible with both 200mm and 300mm process nodes and has a resolution of resolution ≦ 130 nm. When the NSR S205C was originally released in 2000, it boasted the the world's first ultra-high N.A. (0.75) projection lens as well as a KrF excimer laser. The system can process 140+ 200mm wafers/hour (16% higher throughput than Nikon's previous system). Applications for the NSR S205C include mass production of DRAM and MPU.Documents
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NIKON
NSR-S205C
Verified
CATEGORY
248nm DUV
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
47831
Wafer Sizes:
Unknown
Vintage:
Unknown
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NIKON
NSR-S205C
Verified
CATEGORY
248nm DUV
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
47831
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No missing partsConfiguration
No ConfigurationOEM Model Description
This Nikon Step-and-Repeat Scanning System is compatible with both 200mm and 300mm process nodes and has a resolution of resolution ≦ 130 nm. When the NSR S205C was originally released in 2000, it boasted the the world's first ultra-high N.A. (0.75) projection lens as well as a KrF excimer laser. The system can process 140+ 200mm wafers/hour (16% higher throughput than Nikon's previous system). Applications for the NSR S205C include mass production of DRAM and MPU.Documents
No documents