KrF photolithography system supports high-volume manufacturing of semiconductor devices. The ES6a scanning stepper utilizes Canon’s Advanced Flexible Illumination System (AFIS) to resolve 90 nanometer features. 

Canon Inc. is the world’s largest camera manufacturer with a history spanning over 80 years, during which time they have made some of the most important innovations within both photographic and video technology.

CANON

FPA-6000ES6a

The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.

Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NSR-S204B

NSR-S208D

The Canon FPA-6000ES5 is a KrF (248nm) scanner built on Canon’s 300mm-ready FPA-6000 single-stage platform. It has an 0.80 numerical aperture and an ultra-low aberration 4:1 reduction lens system, capable of projecting IC features as small as 110nm. It is aimed at chip manufacturers moving processes to 110nm and 90nm nodes. The platform integrates two ultra-technologies, optical lithography and mechanical forces, to achieve an equal mastery of both.

248nm DUV

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Manufacturers of 248nm DUV

Top Products for 248nm DUV

FPA-6000ES6a

NSR-S204B

NSR-S208D

FPA-6000ES5