Description
90nm KrF ScannerConfiguration
Uniformity(1.811%), Intensity(24299.68W/m2), 6" Reticle Inline((R->L), Cymer Laser(ELS-7310). Fab out (Jan. 2019)OEM Model Description
KrF photolithography system supports high-volume manufacturing of semiconductor devices. The ES6a scanning stepper utilizes Canon’s Advanced Flexible Illumination System (AFIS) to resolve 90 nanometer features.Documents
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CANON
FPA-6000ES6a
Verified
CATEGORY
248nm DUV
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
95106
Wafer Sizes:
12"/300mm
Vintage:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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CANON
FPA-6000ES6a
CATEGORY
248nm DUV
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
95106
Wafer Sizes:
12"/300mm
Vintage:
2007
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
90nm KrF ScannerConfiguration
Uniformity(1.811%), Intensity(24299.68W/m2), 6" Reticle Inline((R->L), Cymer Laser(ELS-7310). Fab out (Jan. 2019)OEM Model Description
KrF photolithography system supports high-volume manufacturing of semiconductor devices. The ES6a scanning stepper utilizes Canon’s Advanced Flexible Illumination System (AFIS) to resolve 90 nanometer features.Documents
No documents