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ASML TWINSCAN XT:1400F
    Description
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    Configuration
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    OEM Model Description
    The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
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    ASML

    TWINSCAN XT:1400F

    verified-listing-icon

    Verified

    CATEGORY
    193 nm Step and Scan

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    90829


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    193 nm Step and Scan
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    ASML

    TWINSCAN XT:1400F

    verified-listing-icon
    Verified
    CATEGORY
    193 nm Step and Scan
    Last Verified: Over 60 days ago
    listing-photo-427468ab149444cb820c0976783a84ec-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    90829


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
    Documents

    No documents

    Similar Listings
    View All
    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    193 nm Step and ScanVintage: 0Condition: UsedLast Verified: Over 60 days ago