Description
ASML Twinscan XT 1250 D Scanner, 12" - with Cymer XLA165 -Track Pre-warning signal (APR)s: APR enabled - Avoid Track INPUT/OUTPUT conflicts, Raise AS after APRs: Avoid Track - INPUT/OUTPUT conflicts enabled - Active wafer release for dry WSs: FALSE - Safeguard to prevent loading of reticles with too wide or mispositioned pellicles: Disabled - Continuous clampable wafer table for dry WSs: Absent - Type of wafer table on chuck 1 & 2 for immersion machines: Zerodur version 1 - Wafer Stage Configurations: Wafer Stage type 2 configuration - Wafer Carrier Locations: Right - Wafers per Carriers: 25 - Wafer Mark Sensors: Absent - Wafer Id Readers: Absent - Wafer Tracks: Present - Wafer Stage Types: Dual Chuck - Wafer Stress Relaxations: FALSE - Lower Docking Plates: Present - WS Balance Masss: Stainless Steel - WH Robot Power Amplifiers: CPM 20 - Wafer Stage Fast Stiff X Move Electronics: Present - Wafer Stage Mirror Block Down Electronics: Present - Universal Pre Alignments: Disabled - Interferometer axis version at exposures: 3 plus 1 axis - Wafer Handling Pneumatics: Dedicated - Wafer Switches: Absent - Type of immersion hood for immersions: None - Specifies chuck 1 & 2 layout relev. for Immersions: Chuck does not support immersion - Specifies chuck 1 & 2 configs: Dry - Specifies chuck 1 & 2 versions: not specified - Changed Short Stroke diff XY controllers: Disabled - Docking wheels at WH unloads: Present - Docking plate heights: Low - Immersion Hood versions: Absent - Carrier Handler Types: Mark I 300 Foup - Wafer Handling Load & Unload Robot Types: Double Fold Arm, 12 mm Z stroke - Wafer Handling Store Units: Absent - Wafer Handler wrt BF Shifted in Zs: Not Shifted - Reticle streaming lites: Disabled - Enhancements in Reticle Monitors: no enhancements - Reticle streaming: Disabled - Improvements for reticle handlings: Disabled - Extend IRIS maximum particles scanned to 50000.s: Absent - Zeroing type for Encoders Measurement Systems: Using extra hall sensors for zeroing - Reticle Stage Chuck Types: Glued Leaf Spring, TYPE_2: Glued LS, Pneum. GC, IFM / ENC Nitrogen purging of Reticle Stages: RS is not purged - Reticle Carrier Locations: Right - Integrated Reticle Inspection Systems: PPD1 with IRIS1 functionality - Integrated Reticle Libraries: IRL with original functionality - Reticle Sizes: 6 inch - Reticle Carrier Tag Readers: Present - Reticle Stage Long Stroke Motor Types: Cobalt Ferro 18 teeth - Reticle Stage Long Stroke Configs: TYPE_3:CoFe_18 motor, SB controlled, int. vacuum supply, pneum GC - Automated Reticle Transport Systems: Absent - Reticle Stage Lens Cooler Boxes: Lens Cooler Box with anti-aliasing Filter - Maximum Reticle ID Lengths: 24 Characters - Reticle Stage Measurement System on Scans: Heidenhain Encoders - Relative direction of ws to rs on the X axis: Same - RS Object Fields: Normal - Reticle exchange types: Retex option: EConfiguration
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ASML
TWINSCAN XT:1250D
Verified
CATEGORY
193 nm Step and Scan
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
76148
Wafer Sizes:
12"/300mm
Vintage:
Unknown
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View AllASML
TWINSCAN XT:1250D
CATEGORY
193 nm Step and Scan
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
76148
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available