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ASML TWINSCAN AT:1150C
    Description
    No description
    Configuration
    -ARF Scanners, 12" -193nm
    OEM Model Description
    The TWINSCAN C product family will be available on four systems: the AT:400C, AT:750C, AT:850C and AT:1150C. The productivity enhancements in TWINSCAN C increase wafer output to over 110 wafers per hour for 300 mm wafers at real production conditions (109 exposures per wafer). The increased stage speeds in the TWINSCAN platform allow for these productivity improvements while maintaining imaging, alignment and leveling accuracy.
    Documents

    No documents

    ASML

    TWINSCAN AT:1150C

    verified-listing-icon

    Verified

    CATEGORY
    193 nm Step and Scan

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    65726


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown

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    Logistics Support
    Available
    Money Back Guarantee
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    Transaction Insured by Moov
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    ASML TWINSCAN AT:1150C

    ASML

    TWINSCAN AT:1150C

    193 nm Step and Scan
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    ASML

    TWINSCAN AT:1150C

    verified-listing-icon
    Verified
    CATEGORY
    193 nm Step and Scan
    Last Verified: Over 60 days ago
    listing-photo-06fd0190b07d40eba0a142c0c3094dc1-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    65726


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    -ARF Scanners, 12" -193nm
    OEM Model Description
    The TWINSCAN C product family will be available on four systems: the AT:400C, AT:750C, AT:850C and AT:1150C. The productivity enhancements in TWINSCAN C increase wafer output to over 110 wafers per hour for 300 mm wafers at real production conditions (109 exposures per wafer). The increased stage speeds in the TWINSCAN platform allow for these productivity improvements while maintaining imaging, alignment and leveling accuracy.
    Documents

    No documents

    Similar Listings
    View All
    ASML TWINSCAN AT:1150C

    ASML

    TWINSCAN AT:1150C

    193 nm Step and ScanVintage: 0Condition: UsedLast Verified: Over 60 days ago