Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

Applied Materials offers PECVD (Plasma-Enhanced Chemical Vapor Deposition) TEOS (tetraethyl orthosilicate) and silane-based oxide and nitride films for high-productivity blanket film applications for ≤90nm technology nodes. These films deliver excellent thickness uniformity, low particulates, and repeatable film stress which make them ideal solutions for liner and capping layers for passivation, thick pre-metal dielectric (PMD) capacitor layer, and inter-metal dielectric (IMD) applications.

For 130nm and 90nm copper dual damascene schemes, the Producer PECVD system offers production-proven TEOS FSG (fluorinated silicate glass) as the low k dielectric (k=3.45) and Damascene Nitride as the etch-stop and copper barrier layer. Damascene Nitride provides a unique in-situ copper removal step to ensure excellent adhesion and improved device reliability. High etch selectivity to FSG and low hydrogen content make this film ideal as an etch-stop layer. The TEOS FSG film, which is deposited on top of Damascene Nitride, provides significantly higher device reliability and performance compared to silane-based FSG films due to its inherent fluorine stability and moisture resistance. The 3.45 k-value reduces capacitance versus USG (undoped silicate glass) and silane FSG films, thereby increasing device speed and lowering power consumption for devices.

These PECVD processes run on the production-proven, high-throughput Applied Producer platform. With its innovative Twin Chamber architecture, the Producer platform enables simultaneous processing of up to six wafers for superior productivity and significant reduction in cost of ownership with high system reliability. Platform extendibility enables customers to leverage the Producer toolset for multiple process nodes.

PRODUCER GT PECVD

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APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

PECVD

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APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

PRODUCER GT PECVD

PECVD

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APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD

APPLIED MATERIALS (AMAT)

PRODUCER GT PECVD