Description
WETConfiguration
1MF+6bath（SPM*2，POU*2（HF/HCL/NH4OH/H2O2, SD2*2）OEM Model Description
The EXPEDIUS™ -i is the latest auto wet station succeeding from the EXPEDIUS™ +, a platform featuring further improvements in process performance and productivity. The system has a highly cost effective solution designed for 45nm and beyond technology node for semiconductor manufacturing. The EXPEDIUS™ -i achieved a throughput of 1,000 wafers per hour (a 150% increase compared with the previous model), high productivity, and low Cost of Ownership. Implementation of the chemical treatment and pure water rinse tanks, well-optimized dryer module improves its cleaning and resist stripping performance significantly. The system realized greatly improvement both etch shape control and process stability for the selective etch process. Furthermore, in order to suppress pattern collapse of vulnerable structures, advanced dryer contributes to reduce processing time drastically and collaborate with optimum sequencing, the system achieved shortened throughput times and the highest level of cost performance in the industry.Documents
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TEL / TOKYO ELECTRON
EXPEDIUS-i
Verified
CATEGORY
Wet processing
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93658
Wafer Sizes:
Unknown
Vintage:
Unknown
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Refurbishment Services
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TEL / TOKYO ELECTRON
EXPEDIUS-i
Verified
CATEGORY
Wet processing
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93658
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
WETConfiguration
1MF+6bath（SPM*2，POU*2（HF/HCL/NH4OH/H2O2, SD2*2）OEM Model Description
The EXPEDIUS™ -i is the latest auto wet station succeeding from the EXPEDIUS™ +, a platform featuring further improvements in process performance and productivity. The system has a highly cost effective solution designed for 45nm and beyond technology node for semiconductor manufacturing. The EXPEDIUS™ -i achieved a throughput of 1,000 wafers per hour (a 150% increase compared with the previous model), high productivity, and low Cost of Ownership. Implementation of the chemical treatment and pure water rinse tanks, well-optimized dryer module improves its cleaning and resist stripping performance significantly. The system realized greatly improvement both etch shape control and process stability for the selective etch process. Furthermore, in order to suppress pattern collapse of vulnerable structures, advanced dryer contributes to reduce processing time drastically and collaborate with optimum sequencing, the system achieved shortened throughput times and the highest level of cost performance in the industry.Documents
No documents
Similar Listings
View AllTEL / TOKYO ELECTRON
EXPEDIUS-i
Wet processingVintage: 0Condition: UsedLast Verified: Over 30 days agoTEL / TOKYO ELECTRON
EXPEDIUS-i
Wet processingVintage: 0Condition: UsedLast Verified: Over 60 days agoTEL / TOKYO ELECTRON