Description
POST CMP CLEANING SYSTEMConfiguration
Dual brush and top side brush chambers, spin dry Post CMP ScrubberOEM Model Description
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.Documents
No documents
SCREEN / DNS / DAINIPPON SCREEN
AS-2000
Verified
CATEGORY
Wet Benches - Auto
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93099
Wafer Sizes:
8"/200mm
Vintage:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SCREEN / DNS / DAINIPPON SCREEN
AS-2000
CATEGORY
Wet Benches - Auto
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93099
Wafer Sizes:
8"/200mm
Vintage:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
POST CMP CLEANING SYSTEMConfiguration
Dual brush and top side brush chambers, spin dry Post CMP ScrubberOEM Model Description
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.Documents
No documents