Description
Post CMW ScrubberConfiguration
Dual brush and top side brush chambers, spin dry Gas - 1:100 DHF, 1:100 NH4OH PROGRESS TYPE: WET/ CMP COMPONENT: MAINFRAME CHEMICAL CABINET x 2EA MX-7500 TBC BRUSH LOAD CELL AMP PRE-TECH FINEJET GENERATOR 0.500VA AC TRANSFOMER FA-21000A PC SGD DRIVE_YASKAWA HF CIRCULATION FILTER UT3-F3AE-B TOUCH PANEL HFC-VWE HITACHI INVERTER RORZE CURT-2032-0 SLURRY FLOW CONTROLLER INTERFACE/ POWER BOXOEM Model Description
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.Documents
No documents
CATEGORY
Wet Benches - Auto
Last Verified: 10 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
119534
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
SCREEN / DNS / DAINIPPON SCREEN
AS-2000
CATEGORY
Wet Benches - Auto
Last Verified: 10 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
119534
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Post CMW ScrubberConfiguration
Dual brush and top side brush chambers, spin dry Gas - 1:100 DHF, 1:100 NH4OH PROGRESS TYPE: WET/ CMP COMPONENT: MAINFRAME CHEMICAL CABINET x 2EA MX-7500 TBC BRUSH LOAD CELL AMP PRE-TECH FINEJET GENERATOR 0.500VA AC TRANSFOMER FA-21000A PC SGD DRIVE_YASKAWA HF CIRCULATION FILTER UT3-F3AE-B TOUCH PANEL HFC-VWE HITACHI INVERTER RORZE CURT-2032-0 SLURRY FLOW CONTROLLER INTERFACE/ POWER BOXOEM Model Description
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.Documents
No documents
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