Overview

The Models SCSx124 and SCSx126 are highly efficient cleaning systems designed for Photomasks, Wafers, and Substrates, particularly suitable for submicron cleaning. These systems are recognized for their reliability and cost-effectiveness, leveraging a proven assortment of cleaning technologies. They offer versatile configuration options, including Atomizing Mist Nozzle, Brushes, Megasonic Nozzles & Pies, High Pressure Deionized (DI) water, among others, to cater to different cleaning requirements. Furthermore, they feature a rapid and effective drying technique that utilizes variable spin speeds, ensuring thorough and efficient drying of the cleaned items.