The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates.  The very reliable and cost effective system utilizes proven assortment of cleaning technologies.  The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more.  The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp.  The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory. 

ULTRA-T EQUIPMENT / UTE

SCSe124

SCSi124

SWC 111

ILR-400

The Models SCSx124 and SCSx126 are highly efficient cleaning systems designed for Photomasks, Wafers, and Substrates, particularly suitable for submicron cleaning. These systems are recognized for their reliability and cost-effectiveness, leveraging a proven assortment of cleaning technologies. They offer versatile configuration options, including Atomizing Mist Nozzle, Brushes, Megasonic Nozzles & Pies, High Pressure Deionized (DI) water, among others, to cater to different cleaning requirements. Furthermore, they feature a rapid and effective drying technique that utilizes variable spin speeds, ensuring thorough and efficient drying of the cleaned items.

ULTRA-T EQUIPMENT / UTE

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Top ULTRA-T EQUIPMENT / UTE Wafer Scrubber

SCSe124

SCSi124

SWC 111

ILR-400

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