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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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ULTRA-T EQUIPMENT / UTE SCSe124
    Description
    Substrate Cleaning System
    Configuration
    No Configuration
    OEM Model Description
    The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.
    Documents

    No documents

    ULTRA-T EQUIPMENT / UTE

    SCSe124

    verified-listing-icon

    Verified

    CATEGORY
    Wafer Scrubber

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78197


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    ULTRA-T EQUIPMENT / UTE SCSe124

    ULTRA-T EQUIPMENT / UTE

    SCSe124

    Wafer Scrubber
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    ULTRA-T EQUIPMENT / UTE

    SCSe124

    verified-listing-icon
    Verified
    CATEGORY
    Wafer Scrubber
    Last Verified: Over 60 days ago
    listing-photo-0c7e2ac25a804d0e919763d8451aa287-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73282/0c7e2ac25a804d0e919763d8451aa287/1f4e0655141c4aa2affb049b318b6fcd_f97d098110044f0682674dd669d3a9e845005c_mw.jpeg
    listing-photo-0c7e2ac25a804d0e919763d8451aa287-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73282/0c7e2ac25a804d0e919763d8451aa287/ee2c91792e224a2fb6c13d8108eb61d4_984a8f53bf2443a5a1e3638c5837d67c45005c_mw.jpeg
    listing-photo-0c7e2ac25a804d0e919763d8451aa287-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73282/0c7e2ac25a804d0e919763d8451aa287/4f187a21503f46f3a1b5adfbd98dd572_9e1ee5b3b8764327890e422cab3260f145005c_mw.jpeg
    listing-photo-0c7e2ac25a804d0e919763d8451aa287-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73282/0c7e2ac25a804d0e919763d8451aa287/d925c32c5ac94f49acbb100472319e2e_8eda7e8929b14dca97f4b93cc94732ec45005c_mw.jpeg
    listing-photo-0c7e2ac25a804d0e919763d8451aa287-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73282/0c7e2ac25a804d0e919763d8451aa287/d50fb0b2bb014159a09eabea9b01ad67_88053e4dd49d471aad0c92903356962e45005c_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78197


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Substrate Cleaning System
    Configuration
    No Configuration
    OEM Model Description
    The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.
    Documents

    No documents

    Similar Listings
    View All
    ULTRA-T EQUIPMENT / UTE SCSe124

    ULTRA-T EQUIPMENT / UTE

    SCSe124

    Wafer ScrubberVintage: 0Condition: UsedLast Verified:Over 60 days ago
    ULTRA-T EQUIPMENT / UTE SCSe124

    ULTRA-T EQUIPMENT / UTE

    SCSe124

    Wafer ScrubberVintage: 0Condition: UsedLast Verified:19 days ago