Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The Opti-Probe 3260 (OP-3260) is a metrology tool developed by Therma-Wave that offers a 30% increase in productivity. It has the same thick and thin film measurement capabilities as the original Opti-Probe, making it the only choice for measuring TiN t, n, and k in the UV range down to 190nm. The OP-3260 also features better robotics, Pentium-speed processing, a spectrometric light source that can be changed in 15 minutes without optics recalibration, and the surest pattern recognition in the business. These improvements result in a significant jump in productivity, making it easier to turn out more wafers.Documents
No documents
KLA / THERMA-WAVE
OP-3260
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
113514
Wafer Sizes:
Unknown
Vintage:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA / THERMA-WAVE
OP-3260
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
113514
Wafer Sizes:
Unknown
Vintage:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The Opti-Probe 3260 (OP-3260) is a metrology tool developed by Therma-Wave that offers a 30% increase in productivity. It has the same thick and thin film measurement capabilities as the original Opti-Probe, making it the only choice for measuring TiN t, n, and k in the UV range down to 190nm. The OP-3260 also features better robotics, Pentium-speed processing, a spectrometric light source that can be changed in 15 minutes without optics recalibration, and the surest pattern recognition in the business. These improvements result in a significant jump in productivity, making it easier to turn out more wafers.Documents
No documents