Description
Nanometrics Nanospec 210 Film Thickness MeasureConfiguration
*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.OEM Model Description
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
66020
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
66020
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Nanometrics Nanospec 210 Film Thickness MeasureConfiguration
*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.OEM Model Description
None ProvidedDocuments
No documents