Description
good working condition, can demonstrateConfiguration
- Range of Thicknesses: 100 to 500,000 angstroms - Typical Measurement Time: 2.5 seconds. - Spot Size: 50 um with 5x objective 25 um with 10x objective 6.5 um with 40x objective - Film Types Measured: Oxide on Silicon Nitride on Silicon Negative Resist on Silicon Polysilicon on Oxide Negative Resist on Oxide Nitride on Oxide Polyimide on Silicon Positive Resist on Silicon Positive Resist on Oxide - Reflectance Mode: Thick Films - Reproducibility: 5A ± 5% depending upon the film typeOEM Model Description
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
66396
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
66396
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
good working condition, can demonstrateConfiguration
- Range of Thicknesses: 100 to 500,000 angstroms - Typical Measurement Time: 2.5 seconds. - Spot Size: 50 um with 5x objective 25 um with 10x objective 6.5 um with 40x objective - Film Types Measured: Oxide on Silicon Nitride on Silicon Negative Resist on Silicon Polysilicon on Oxide Negative Resist on Oxide Nitride on Oxide Polyimide on Silicon Positive Resist on Silicon Positive Resist on Oxide - Reflectance Mode: Thick Films - Reproducibility: 5A ± 5% depending upon the film typeOEM Model Description
None ProvidedDocuments
No documents