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KLA / ADE ULTRAGAGE 9700
  • KLA / ADE ULTRAGAGE 9700
  • KLA / ADE ULTRAGAGE 9700
  • KLA / ADE ULTRAGAGE 9700
Description
No description
Configuration
No Configuration
OEM Model Description
The UltraGage 9700 system, introduced in 1995, is based on the E-Plus station measurement module. The UltraGage 9000 systems are capable of being operated in a class 10 cleanroom environment. These systems were designed to operate together with applications software to be used by device manufacturers in applications such as chemical mechanical planarization ("CMP") and thermal processing.
Documents

No documents

PREFERRED
 
SELLER
CATEGORY
Thin Film / Film Thickness

Last Verified: Over 60 days ago

Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

98161


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

KLA / ADE

ULTRAGAGE 9700

verified-listing-icon
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
listing-photo-87b9621cba0e4033907b93a2ec0839cc-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

98161


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
No Configuration
OEM Model Description
The UltraGage 9700 system, introduced in 1995, is based on the E-Plus station measurement module. The UltraGage 9000 systems are capable of being operated in a class 10 cleanroom environment. These systems were designed to operate together with applications software to be used by device manufacturers in applications such as chemical mechanical planarization ("CMP") and thermal processing.
Documents

No documents