Description
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.Configuration
0.20 0.68 4:1 25*33 FIA:50OEM Model Description
Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth.Documents
No documents
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131671
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-S203B
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131671
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.Configuration
0.20 0.68 4:1 25*33 FIA:50OEM Model Description
Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth.Documents
No documents