Description
Step-and-Repeat Exposure System Support equpment AC power distribution system Electricity Box Link to wafer track: Link from Left SideConfiguration
Resolution≦ 350 nm NA: 0.63 Exposure light source: i-line (365 nm wavelength) Reduction ratio: 1:5 Exposure field: 22 mm square to 17.9 (H) × 25.2 (V) mm Alignment accuracy: (EGA, |M| + 3σ)≦ 70 nm Alignment system: LSA (standard), FIA (optional), LIA (optional) Control Syste,: VAX StationOEM Model Description
The Nikon NSR-2205i11D is a step-and-repeat scanning system with a resolution of 350nm or better and a NA of 0.63. It uses an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy is 70nm or better and the alignment system is LSA (standard), FIA (optional), LIA (optional). I hope that helps! Let me know if you have any other questions.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
148410
Wafer Sizes:
6"/150mm
Vintage:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
NSR-2005i11D
CATEGORY
Steppers & Scanners
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
148410
Wafer Sizes:
6"/150mm
Vintage:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Step-and-Repeat Exposure System Support equpment AC power distribution system Electricity Box Link to wafer track: Link from Left SideConfiguration
Resolution≦ 350 nm NA: 0.63 Exposure light source: i-line (365 nm wavelength) Reduction ratio: 1:5 Exposure field: 22 mm square to 17.9 (H) × 25.2 (V) mm Alignment accuracy: (EGA, |M| + 3σ)≦ 70 nm Alignment system: LSA (standard), FIA (optional), LIA (optional) Control Syste,: VAX StationOEM Model Description
The Nikon NSR-2205i11D is a step-and-repeat scanning system with a resolution of 350nm or better and a NA of 0.63. It uses an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy is 70nm or better and the alignment system is LSA (standard), FIA (optional), LIA (optional). I hope that helps! Let me know if you have any other questions.Documents
No documents