Description
5x Reduction StepperConfiguration
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM Model Description
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Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131961
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
GCA
AutoStep 200
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131961
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
5x Reduction StepperConfiguration
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM Model Description
None ProvidedDocuments
No documents