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Description
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* Minimum substrate size: 10x10 mm * Computer programmable recipes on hdd * Lens: Olympus 2142: NA = 0.42; Depth of field = 1.2 um for 0.7 um process * Maximum die size: ~15 mm x 15 mm * Resolution: 500 nm over portion of field; 700 nm over entire field * Mask Plates: 5x5x0.090 inches, 5x reduction, typically Soda Lime Glass (Quartz is also acceptable), no pellicle. * Registration tolerance: Max 0.30 um global alignment; Max 0.15 um local alignment (with care, you can achieve < 0.10 um registration)OEM Model Description
The GCA 6300 DSW steppers have chucks for 3", 100 mm, and 150 mm wafers. Pieces smaller than this can also be used but there is no special chuck for this purpose.Documents
No documents
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
118004
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
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Available
Money Back Guarantee
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Transaction Insured by Moov
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GCA
6300 DWS
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
118004
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
* Minimum substrate size: 10x10 mm * Computer programmable recipes on hdd * Lens: Olympus 2142: NA = 0.42; Depth of field = 1.2 um for 0.7 um process * Maximum die size: ~15 mm x 15 mm * Resolution: 500 nm over portion of field; 700 nm over entire field * Mask Plates: 5x5x0.090 inches, 5x reduction, typically Soda Lime Glass (Quartz is also acceptable), no pellicle. * Registration tolerance: Max 0.30 um global alignment; Max 0.15 um local alignment (with care, you can achieve < 0.10 um registration)OEM Model Description
The GCA 6300 DSW steppers have chucks for 3", 100 mm, and 150 mm wafers. Pieces smaller than this can also be used but there is no special chuck for this purpose.Documents
No documents