Description

Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.

Configuration

0.35 0.45~0.63 5:1 22*26 60

OEM Model Description

The FPA-3000i5 is a Fine Pattern Aligner that can write submicron images on a silicon wafer. It has a 0.35 µm lithography and can process 74 wafers per hour. It has a 0.63 NA and uses the latest off-axis illumination technique (SIA II). The FPA-3000i5 has improved lens performance, better wafer edge chip auto-focusing, and increased illumination intensity. It has a small footprint and a multitasking touch screen operation. It is compatible with Canon’s family of lithography steppers.

Documents

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CANON

FPA-3000i5

Verified

Steppers & Scanners

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

131680

Wafer Sizes:

4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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