Description
No descriptionConfiguration
Reticle size: 6" Square Field Size: 22 X 22 mm Exposure Light: 248 nm, DUV Light Source KrF Excimer Laser CYMER/ELS-53XX (NOT INCLUDED) Projection Magnification: 1/5 X Numerical Aperture: 0.63~0.45 Estimated Throughput: 85 wph (60 shot / 22 mm / 8” Wafer) 110 wph (32 shot / 22 mm / 6" Wafer)OEM Model Description
The Canon FPA-3000EX5 is a high throughput excimer-laser stepper designed for critical layer mass production of 64Mb and 256Mb DRAMs and next-generation microprocessors. It offers a 23% higher throughput than its predecessor, the EX4, with a throughput of more than 90 wafers per hour. It has the industry’s best optical performance and maintains compatibility with existing Canon 5x i-line step-and-repeat tools. The EX5 has a newly designed projection lens with a numerical aperture (NA) of 0.63 and 0.22µm resolution in an exposure area of 22mm x 22mm. It also has an on-the-fly focusing system, an improved advanced global alignment (AGA) scheme, and a high-output Cymer 5000 series excimer laser source. The FPA-3000EX5 stepper shares many of the same technology innovations as other models in Canon’s i-line stepper family, making it an efficient mix-and-match partner with existing critical-layer and rough-layer steppers.Documents
No documents
CANON
FPA-3000EX5
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117148
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-3000EX5
CATEGORY
Steppers & Scanners
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117148
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Reticle size: 6" Square Field Size: 22 X 22 mm Exposure Light: 248 nm, DUV Light Source KrF Excimer Laser CYMER/ELS-53XX (NOT INCLUDED) Projection Magnification: 1/5 X Numerical Aperture: 0.63~0.45 Estimated Throughput: 85 wph (60 shot / 22 mm / 8” Wafer) 110 wph (32 shot / 22 mm / 6" Wafer)OEM Model Description
The Canon FPA-3000EX5 is a high throughput excimer-laser stepper designed for critical layer mass production of 64Mb and 256Mb DRAMs and next-generation microprocessors. It offers a 23% higher throughput than its predecessor, the EX4, with a throughput of more than 90 wafers per hour. It has the industry’s best optical performance and maintains compatibility with existing Canon 5x i-line step-and-repeat tools. The EX5 has a newly designed projection lens with a numerical aperture (NA) of 0.63 and 0.22µm resolution in an exposure area of 22mm x 22mm. It also has an on-the-fly focusing system, an improved advanced global alignment (AGA) scheme, and a high-output Cymer 5000 series excimer laser source. The FPA-3000EX5 stepper shares many of the same technology innovations as other models in Canon’s i-line stepper family, making it an efficient mix-and-match partner with existing critical-layer and rough-layer steppers.Documents
No documents