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Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The CAMECA IMS-6f is an ultra-high vacuum (UHV) system designed for secondary ion mass spectrometry (SIMS) analysis. Equipped with a magnetic sector analyzer, it offers exceptional mass resolving power, with a minimum m/Dm of 25000 (10% definition). The system features a duoplasmatron source that can produce O2+ or O- ions, and a microbeam source for Cs+ ions, providing premium beam stability and ultra-fine minimum beam size (300nm for O2+ and 200nm for Cs+). Key capabilities of the IMS-6f include low detection limits and high resolving power in depth profiling, ultra-shallow depth profiling, 3D ion imaging, and excellent charge neutralization, making it an advanced tool for studying material surfaces and interfaces at the nanoscale.Documents
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Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117154
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
Available
CAMECA
IMS-6f
CATEGORY
Spectrometer / SIMS
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117154
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The CAMECA IMS-6f is an ultra-high vacuum (UHV) system designed for secondary ion mass spectrometry (SIMS) analysis. Equipped with a magnetic sector analyzer, it offers exceptional mass resolving power, with a minimum m/Dm of 25000 (10% definition). The system features a duoplasmatron source that can produce O2+ or O- ions, and a microbeam source for Cs+ ions, providing premium beam stability and ultra-fine minimum beam size (300nm for O2+ and 200nm for Cs+). Key capabilities of the IMS-6f include low detection limits and high resolving power in depth profiling, ultra-shallow depth profiling, 3D ion imaging, and excellent charge neutralization, making it an advanced tool for studying material surfaces and interfaces at the nanoscale.Documents
No documents