Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The FEI Strata DB 235 is a dual-beam system that combines the capabilities of a focused ion beam (FIB) and a scanning electron microscope (SEM). It features both a Hexalens electron column and a Magnum ion column, making it well-suited for failure analysis and high-end sample preparation. The SEM component uses a Schottkey emitter and operates at 200-300 kV, while the FIB component uses Gallium liquid metal and operates at 5 to 30 kV with a current range of 1pA to 20 nA. The system offers high resolution, with 3 nm for SEM and 7 nm for FIB. It is controlled by the Window NT system and can perform automated TEM sample preparation. An attached EDAX electron dispersive X-ray analysis system allows for chemical analysis. Additionally, the FIB/SEM has the unique ability to add or remove material with high spatial resolution between precisely defined locations.Documents
No documents
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
STRATA DB 235
Verified
CATEGORY
SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
102841
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
STRATA DB 235
CATEGORY
SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
102841
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The FEI Strata DB 235 is a dual-beam system that combines the capabilities of a focused ion beam (FIB) and a scanning electron microscope (SEM). It features both a Hexalens electron column and a Magnum ion column, making it well-suited for failure analysis and high-end sample preparation. The SEM component uses a Schottkey emitter and operates at 200-300 kV, while the FIB component uses Gallium liquid metal and operates at 5 to 30 kV with a current range of 1pA to 20 nA. The system offers high resolution, with 3 nm for SEM and 7 nm for FIB. It is controlled by the Window NT system and can perform automated TEM sample preparation. An attached EDAX electron dispersive X-ray analysis system allows for chemical analysis. Additionally, the FIB/SEM has the unique ability to add or remove material with high spatial resolution between precisely defined locations.Documents
No documents