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HITACHI SU3500
  • HITACHI SU3500
  • HITACHI SU3500
  • HITACHI SU3500
Description
SEM
Configuration
SEM, Secondary Electron Detector, Reflection Electron Detector, Low Vacuum Secondary Electron Detector, EDX (AMETEC Octane Plus), MC1000 ion Sputter, Etc.
OEM Model Description
SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments.
Documents

No documents

CATEGORY
SEM / FIB

Last Verified: Over 30 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

116070


Wafer Sizes:

Unknown


Vintage:

2016


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

HITACHI

SU3500

verified-listing-icon
Verified
CATEGORY
SEM / FIB
Last Verified: Over 30 days ago
listing-photo-09986ff60de74e73ade03119baaa99e9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

116070


Wafer Sizes:

Unknown


Vintage:

2016


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
SEM
Configuration
SEM, Secondary Electron Detector, Reflection Electron Detector, Low Vacuum Secondary Electron Detector, EDX (AMETEC Octane Plus), MC1000 ion Sputter, Etc.
OEM Model Description
SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments.
Documents

No documents