Description
SEMConfiguration
SEM, Secondary Electron Detector, Reflection Electron Detector, Low Vacuum Secondary Electron Detector, EDX (AMETEC Octane Plus), MC1000 ion Sputter, Etc.OEM Model Description
SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments.Documents
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HITACHI
SU3500
Verified
CATEGORY
SEM / FIB
Last Verified: 20 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116070
Wafer Sizes:
Unknown
Vintage:
2016
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HITACHI
SU3500
CATEGORY
SEM / FIB
Last Verified: 20 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116070
Wafer Sizes:
Unknown
Vintage:
2016
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
SEMConfiguration
SEM, Secondary Electron Detector, Reflection Electron Detector, Low Vacuum Secondary Electron Detector, EDX (AMETEC Octane Plus), MC1000 ion Sputter, Etc.OEM Model Description
SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments.Documents
No documents