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STS HRM
    Description
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    Configuration
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    OEM Model Description
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
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    STS

    HRM

    verified-listing-icon

    Verified

    CATEGORY
    RIE/ICP

    Last Verified: Over 60 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    84050

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

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    STS HRM

    STS

    HRM

    RIE/ICP
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    STS

    HRM

    verified-listing-icon
    Verified
    CATEGORY
    RIE/ICP
    Last Verified: Over 60 days ago
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/6582f22cec8d4f969ba3e18ca306b0af_e056e7cfffb64bd3a8c045aa83e411801201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/52ad8b07b3a7436d992848b184b9f7ea_ae668dacb01745ffb706bfd85b8584311201a_mw.jpeg
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    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/399310ee61464650b345c8d3f9fa781b_1065b7b614c54ccf95889f28f00c44951201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/7438f8d46c1c4cc488acc5d21802777d_2091c0dd1d55410bb116d963bac71df11201a_mw.jpeg
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    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/8e6687bed67a4368915c44c288887c68_f92dc8e4adba4ce89c816dbf70fc424d1201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/56916c84e90a46668786aba79a94fa2c_1a387f6ff23142a5ab07bc03f2654e7a_mw.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    84050

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
    Documents

    No documents

    Similar Listings
    View All
    STS HRM

    STS

    HRM

    RIE/ICPVintage: 0Condition: UsedLast Verified: Over 60 days ago