Description
Defect DetectionConfiguration
Software Version: 4.2.24 Process: Reticle InspectionOEM Model Description
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.Documents
No documents
KLA
SL301
CATEGORY
Reticle / Mask Inspection
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
153866
Wafer Sizes:
12"/300mm
Vintage:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Defect DetectionConfiguration
Software Version: 4.2.24 Process: Reticle InspectionOEM Model Description
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.Documents
No documents