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SL301
Category
Reticle / Mask InspectionOverview
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.
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