Description
lon concentration No missing parts Current Wafer size : 8Configuration
No ConfigurationOEM Model Description
The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.Documents
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KLA / THERMA-WAVE
TP-420
Verified
CATEGORY
Reticle / Mask Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107110
Wafer Sizes:
6"/150mm, 8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA / THERMA-WAVE
TP-420
CATEGORY
Reticle / Mask Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107110
Wafer Sizes:
6"/150mm, 8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
lon concentration No missing parts Current Wafer size : 8Configuration
No ConfigurationOEM Model Description
The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.Documents
No documents