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PERKIN ELMER 2400-8SA
  • PERKIN ELMER 2400-8SA
  • PERKIN ELMER 2400-8SA
  • PERKIN ELMER 2400-8SA
Description
No description
Configuration
2400 8SA w' CTI cryo that is being rebuilt
OEM Model Description
The Perkin-Elmer Model 2400-8SA features a large 211/2” rotating, water cooled annular table with a capacity of sixty-four 2″, thirty 3″, or thirteen 4″ wafers. Used in conjunction with a cathode shaping aperture, the rotating table permits high uniformity. A 4″ wafer vertical range of the table facilitates coating bulk substrates. As an added feature, up to three 8″ round cathodes may be specified allowing sequential deposition from several targets or alternately, static deposition or heating from any target position.
Documents

No documents

CATEGORY
PVD / Sputtering

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

73547


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

PERKIN ELMER

2400-8SA

verified-listing-icon
Verified
CATEGORY
PVD / Sputtering
Last Verified: Over 60 days ago
listing-photo-8d8158589c2447d8bdef8c3cdfaca175-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

73547


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
2400 8SA w' CTI cryo that is being rebuilt
OEM Model Description
The Perkin-Elmer Model 2400-8SA features a large 211/2” rotating, water cooled annular table with a capacity of sixty-four 2″, thirty 3″, or thirteen 4″ wafers. Used in conjunction with a cathode shaping aperture, the rotating table permits high uniformity. A 4″ wafer vertical range of the table facilitates coating bulk substrates. As an added feature, up to three 8″ round cathodes may be specified allowing sequential deposition from several targets or alternately, static deposition or heating from any target position.
Documents

No documents